• 163am银河线路娱乐官网

    目录产品 » 蛋白分离纯化 » 蛋白纯化介质 » High Affinity Ni-Charged Resin FF
    High Affinity Ni-Charged Resin FF

    High Affinity Ni-Charged Resin FF

    Figure 1. Schematic diagram of the chemical structure of Ni IDA Resin, Ni IDA Resin FF, Hi affinity Ni-Charged Resin and Hi affinity Ni-Charged Resin FF

    High Affinity Ni-Charged Resin FF

    GenScript High Affinity Ni-Charged Resin FF is an 6% highly cross-linked agarose medium covalently coupled to a chelating agent that binds Ni2+ by four coordination sites for high-affinity purification of polyhistidine-tagged recombinant proteins.
    L00666
    ¥403

    163am银河线路娱乐官网
    Description

    GenScript High Affinity Ni-Charged Resin FF is an 6% highly cross-linked agarose medium covalently coupled to a chelating agent that binds Ni2+ by four coordination sites for high-affinity purification of polyhistidine-tagged recombinant proteins.
    High Affinity Ni-Charged Resin FF has low Ni2+ leakage, high protein-binding capacity and stability, and is compatible with a wide range of additives used in protein purification. This makes High Affinity Ni Charged Resin FF the excellent choice for high performance purification of polyhistidine-tagged proteins.

    Characteristics of High Affinity Ni-Charged Resin FF
    Matrix spherical
    6% highly cross-linked agarose
    Average particle size
    90 µm (45-165 µm)
    Dynamic Binding capacity1
    ≥50 mg of histidine-tagged protein /mL settled resin
    Storage solution 
    20% ethanol
    Storage temperaturestored at 2-8 °C; DO NOT FREEZE
    1 Dynamic binding capacity conditions:
    Sample: 5 mg/mL (histidine)6-tagged pure proteins (Mr 43 000) in binding buffer (capacity at 10%  Breakthrough)
    Column volume: 1 mL 
    Retention time: 3min
    Flow rate: 0.333 mL/min
    Binding buffer: 20 mM sodium phosphate, 500 mM NaCl, 10 mM imidazole, pH 7.4
    Elution buffer: 20 mM sodium phosphate, 500 mM NaCl, 250 mM imidazole, pH 7.4 
    Note: Dynamic binding capacity is protein-dependent.

    Reagents Compatible with High Affinity Ni-Charged Resin FF

    Reducing agentsDenaturants
    DetergentsSaltsOthers
    1 mM DTT6 M Gua·HCl
    2% Triton X-1004 M MgCl250% glycerol
    20 mM β-ME       
    8 M Urea  
    2% Tween 205 mM CaCl220% ethanol
    5mM TCEP-HCl——50% glycerin2 M NaCl1 mM EDTA
    10 mM reduced glutathione————100mM Na2SO460 mM citrate
    † Tested for 1 week at 40°C. 
     The strong chelator EDTA has been used successfully in some cases at 1 mM. Generally, chelating agents should be used with caution (and only in the sample, not in buffers). Any metal ion stripping may be counteracted by addition of a small excess of MgCl2 before centrifugation/filtration of the sample. Note that stripping effects may vary with applied sample volume.

    • High Affinity Ni-Charged Resin FF
    • High Affinity Ni-Charged Resin FF

    • High Affinity Ni-Charged Resin FF
    • High Affinity Ni-Charged Resin FF

      Figure 1. Schematic diagram of the chemical structure of Ni IDA Resin, Ni IDA Resin FF, Hi affinity Ni-Charged Resin and Hi affinity Ni-Charged Resin FF


    For research and manufacturing use. Direct human use, including taking orally and injection are forbidden.


    喜欢新升级的网站吗?

    讨厌

    不喜欢

    一般

    喜欢

    非常喜欢

    *